| 摘要 |
The present invention provides: a method for manufacturing an insulated conductive pattern, wherein a conductive film and an insulation layer pattern are formed on a substrate, and the insulation layer pattern is reformed to cover a conductive pattern after formation of the conductive pattern by etching the conductive film using the insulation layer pattern as a mask; and a laminate manufactured thereby. According to the present invention, the number of processes is sharply reduced in comparison with the existing processes, and economic efficiency can be greatly improved. |
