| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a scanning exposure apparatus using microlens arrays, even if an exposure pattern is deviated from a reference pattern, capable of preventing a displacement of an exposure pattern by detecting deviation during the exposure, and improving the accuracy of the exposure pattern in overlay exposure. <P>SOLUTION: This scanning exposure apparatus projects the exposure pattern of a mask on a substrate 1 by a plurality of microlens arrays 2. Then, the image on the substrate 1 is detected by a line CCD camera and whether the exposure pattern on the mask 3 is accorded with a reference pattern or not, with a first layer pattern on the substrate defined as the reference pattern. When the exposure pattern is not accorded with the reference pattern, the microlens arrays 2 are inclined from a direction parallel to the substrate 1 to adjust the exposure area on the substrate by the microlens arrays 2 and make the exposure pattern of the mask accord with the reference pattern. <P>COPYRIGHT: (C)2012,JPO&INPIT |
