发明名称 CLEANING SYSTEM FOR OBJECT HOLDING DEVICE AND CLEANING DEVICE FOR OBJECT HOLDING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To efficiently remove dirt attached to a substrate placing surface. <P>SOLUTION: A cover for cleaning 100 is placed opposite to a part of the substrate placing surface (the upper surface of a substrate holder 50). Compressed gas is jetted between the lower surface of the cover for cleaning 100 and the substrate placing surface (between the opposed surfaces) from the cover for cleaning 100 and the substrate holder 50 to agitate gas hard between the opposed surfaces, and the gas is aspirated from between the opposed surfaces by the substrate holder 50. Dirt D on the substrate placing surface which is attached to an area opposed to the lower surface of the cover for cleaning 100 is therefore mixed into the gas agitated between the opposed surfaces and removed by being aspirated with the gas. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012078543(A) 申请公布日期 2012.04.19
申请号 JP20100223400 申请日期 2010.10.01
申请人 NIKON CORP 发明人 AOKI YASUO;ABE FUMIHIKO
分类号 G03F7/20;H01L21/683 主分类号 G03F7/20
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