发明名称 DOUBLE VACUUM PUMP DEVICE, GAS PURIFICATION SYSTEM EQUIPPED WITH THE SAME, AND METHOD OF CONTROLLING THE DOUBLE VACUUM PUMP DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a double vacuum pump device attaining reduced pressure exhaust with little required power not influenced by a gas temperature and air flow vibration. <P>SOLUTION: The double vacuum pump device Y2 includes positive displacement vacuum pumps 40A, 40B and lines 52, 60. Each of the vacuum pumps 40A, 40B has an inlet 41 and an outlet 42. A pressure detector 80 is disposed in the vicinity of the inlet 41 of the double vacuum pump device Y2. The line 52 couples together the outlet 42 of the vacuum pump 40A and the inlet 41 of the vacuum pump 40. The line 60 has an end part E6 and an end part E5 connected to the coupling line 52 and includes a buffer tube Z1 and an on-off valve 61 positioned between the tube Z1 and the end part E5. A pressure detection signal from the pressure detector 80 is used as an on-off signal of the on-off valve 61. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012077683(A) 申请公布日期 2012.04.19
申请号 JP20100223841 申请日期 2010.10.01
申请人 SUMITOMO SEIKA CHEM CO LTD 发明人 HARUNA KAZUO;MARUTA KIYOKAZU;KUWATA HIDENORI;SHIMA KOICHI
分类号 F04C28/02;F04C18/18;F04C23/00;F04C25/02 主分类号 F04C28/02
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