METHODS FOR FABRICATING THIN FILM PATTERN AND ARRAY SUBSTRATE

摘要

A method for fabricating a thin film pattern and a method for fabricating an array substrate are provided. The method for fabricating a thin film pattern comprises: forming a first film and a second film sequentially; applying a layer of photoresist on the second film; forming a photoresist pattern comprising a totally left region, a partially left region and a totally removed region; performing a first wet etching on the second film in the totally removed region; performing a first dry etching on the first film in the totally removed region to form a first pattern, and etching the photoresist layer to remove the photoresist in the partially left region to expose the second film in the partially left region; performing a second wet etching on the second film in the partially left region; performing a second dry etching to form a second pattern; and removing the residual photoresist.