| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition that simultaneously satisfies high sensitivity, high resolution, an excellent pattern profile and excellent line edge roughness on a high level, and that has sufficiently excellent outgassing performance in exposure, as well as an actinic ray-sensitive or radiation-sensitive film and a patterning method using the actinic ray-sensitive or radiation-sensitive resin composition. <P>SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition relating to the invention contains a resin(P) comprising a repeating unit(A) that is decomposed upon irradiation with an actinic ray or radiation to generate an acid and a repeating unit(C) that has a primary or secondary hydroxy group. <P>COPYRIGHT: (C)2012,JPO&INPIT |
