发明名称 INSTRUMENT FOR OBJECTIVE MEASUREMENT OF REFRACTIVE WAVEFRONT ABERRATION, SURGICAL MICROSCOPE, AND SLIT LAMP
摘要 <P>PROBLEM TO BE SOLVED: To provide an instrument for objective measurement of refractive wavefront aberration facilitating the confirmation of a visual field or the recording of eye movement and capable of being also combined with a device other than a surgical microscope. <P>SOLUTION: The instrument for objective measurement of refracted wavefront aberration includes a wavefront measuring system having a light source 100 for irradiating the eyeground of an eye to be examined with illumination light, a Hartmann diaphragm 120 for dividing the reflected light flux reflected from the eyeground of the eye to be examined into a plurality of light fluxes and a light detection part 122 for detecting the divided light fluxes divided by the Hartmann diaphragm 120 and further includes an anterior eye part observation system having a light source 112 for illuminating the anterior eye part of the eye to be examined and a light detection part 114 for detecting the light reflected from the anterior eye part of the eye to be examined. Then, an object lens 108 functions as the object lens common to the wavefront measuring system and the anterior part observation system. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012075491(A) 申请公布日期 2012.04.19
申请号 JP20100220857 申请日期 2010.09.30
申请人 TOPCON CORP 发明人 YOSHIDA KEISUKE;ISHINABE IKUO;TATARA YOKO;YAMAGUCHI TATSUO;MIHASHI TOSHIO;JAMES WOLFFSOHN
分类号 A61B3/10;A61B3/12;A61F9/007 主分类号 A61B3/10
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