| 摘要 |
<P>PROBLEM TO BE SOLVED: To detect the position of a substrate easily. <P>SOLUTION: The exposure device EX comprises an exposure unit which exposes a substrate P to be exposed with a circuit pattern, and an alignment system 4 provided to penetrate the substrate P and to detect the position of the substrate P by passing light through an alignment mark AM becoming a position reference of exposure. The alignment system 4 may comprise an optical member which emits light, and a reflection portion which reflects light emitted from the optical member and passed through the alignment mark AM. <P>COPYRIGHT: (C)2012,JPO&INPIT |
