| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for generating EUV light from gaseous discharge plasma. <P>SOLUTION: The method comprises: applying a vaporizing beam 5 of high energy pulse radiation to a luminescent material 3 in a discharge space 6 located between electrodes 2 and holding therein at least a buffer gas 7 thereby to vaporize the luminescent material; transforming the resultant vaporous luminescent material into discharge plasma which emits EUV light using a pulse discharge current caused between the electrodes; supplying a channel creating beam 4 composed of at least two partial beams; and shaping, converging and directing at the discharge space 6 the partial beams so that focuses of the partial beams are superposed on each other between the electrodes 2 in pulse synchronization. A conductive discharge channel is created along the superposing area by the ionization of the buffer gas 7 existing at least in the discharge space. The channel creating beam 4 of high energy pulse radiation is triggered so that the discharge current pulse reaches its maximum value after the formation of the discharge channel by a pulse radiation current in each case. <P>COPYRIGHT: (C)2012,JPO&INPIT |
