| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an antireflection film that is excellent in scratch resistance, and in which color unevenness is suppressed in a high level, and cissing of the antireflection layer does not occur, by optimizing a surface state of a hard coat layer arranged at lower most layer in the antireflection layer. <P>SOLUTION: The film is formed by sequentially laminating the hard coat layer and the antireflection layer on at least one face of a transparent substrate in this order. The hard coat layer is formed by applying a coating liquid containing an ionizing radiation-curable material to the transparent substrate and curing it with radiation of ionizing radiation. The antireflection layer is formed by applying a coating liquid containing an ionizing radiation-curable material and a surface modifying agent having both or either one of a fluorine-containing group and a silicone skelton to the hard coat layer, and curing it with radiation of ionizing radiation. A contact angle of pure water to the hard coat surface measured according to JIS R3257 (1999) is in the range of 60° or more and 90° or less. <P>COPYRIGHT: (C)2012,JPO&INPIT |
