| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an imprint method capable of filling a gap between a mask of an imprint apparatus and a substrate with a gas having a property which reduces a gas around the mask in a short time. <P>SOLUTION: An imprint method comprises: a step of coating a substrate with a resin; a step of moving the substrate coated with the resin to a shot position of a pattern just under a mask by a substrate stage; and a step of supplying a gas having at least the property of either high fusibility or high diffusibility for the resin to the substrate on a moving path from the position at which the substrate was coated with the resin to the shot position. The supply of the gas is started before a shot region of the substrate coated with the resin passes the supply position of the gas. <P>COPYRIGHT: (C)2012,JPO&INPIT |
