| 摘要 |
The invention relates to a method for obtaining a substrate coated on at least part of its surface, by at least one layer of an oxide of a metal M having a physical thickness of less than or equal to 30 nm, said oxide layer not being included in a stack of layers comprising at least one layer of silver. Said method comprises the following steps: at least one intermediate layer of a material selected from the metal M, a nitride of the metal M, a carbide of the metal M or an oxide sub-stoichiometric in oxygen of the metal M, is deposited by cathodic sputtering, said intermediate layer not being deposited above or below a layer based on titanium oxide, the physical thickness of said intermediate layer being less than or equal to 30 nm; and at least part of the surface of said intermediate layer is oxidised by means of a heat treatment, during which said intermediate layer is in direct contact with an oxidising atmosphere, especially air, the temperature of said substrate not exceeding 150°C during the heat treatment. |
