| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition capable of manufacturing a resist pattern having an excellent focus margin. <P>SOLUTION: There is provided a resist composition containing a resin having a structural unit represented by formula (a) and a salt represented by formula (B1). [where, R<SP POS="POST">1</SP>represents a hydrogen atom or a methyl group; A<SP POS="POST">1</SP>represents a single bond, an aliphatic hydrocarbon group or the like; A<SP POS="POST">2</SP>represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms; ring W<SP POS="POST">1</SP>represents an aliphatic ring having 4 to 36 carbon atoms; ring W<SP POS="POST">2</SP>represents a lactone ring having 4 to 18 carbon atoms; Q<SP POS="POST">1</SP>and Q<SP POS="POST">2</SP>each independently represent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms; L<SP POS="POST">b1</SP>represents an alicyclic hydrocarbon group having 3 to 18 carbon atoms; Y represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms which may contain a substituent; and Z<SP POS="POST">+</SP>represents an organic cation.] <P>COPYRIGHT: (C)2012,JPO&INPIT |
