发明名称 SUBSTRATE ADHERING DEVICE, HEATING DEVICE, LAMINATING SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND LAMINATING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To simplify a structure of a substrate adhering device. <P>SOLUTION: A heating device comprises a first induction heating part arranged on one face side of plural substrates overlaid on each other and induction heating at least one of plural substrates; and a second induction heating part arranged on the other face side of the plural substrates and induction heating at least one of the plural substrates. The heating device further comprises a first stage contacting one face side of the plural substrates, and a second stage opposed to the first stage and nipping the plural substrates between it and the first stage from the other face side of the plural substrates. The first induction heating part is arranged on the first stage, and the second induction heating part may be arranged on the second stage. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012079818(A) 申请公布日期 2012.04.19
申请号 JP20100221763 申请日期 2010.09.30
申请人 NIKON CORP 发明人 TANAKA KEIICHI
分类号 H01L21/02;B23K20/00 主分类号 H01L21/02
代理机构 代理人
主权项
地址