| 摘要 |
An imprint apparatus includes a detection unit configured to detect a mark formed on the mold and a mark formed on the substrate corresponding to a target transfer position, and a control unit configured to obtain information indicating relative position between a mark formed on the mold and a mark formed on the substrate corresponding to the target transfer position. The detection unit detects a mark formed on the mold and a mark formed on the substrate corresponding to the target transfer position, in a state where position of the mold and the substrate is aligned. The control unit performs alignment between the mold and the substrate so that the relative position when the mold and the transfer material are in contact with each other at the target transfer position in the state.
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