DEVICE, SYSTEM AND METHOD FOR USE IN MACHINES FOR ELECTROCHEMICAL PATTERN REPLICATION

摘要

A device and method for electrochemical pattern replication, ECPR, is provided. The device comprises;a base;a bottom chuck on a X-Y-Theta stage;and a Z-stage with an attached top chuck, said chucks being configured to hold a master electrode or a substrate;a displacement monitor system for measuring displacement of the master electrode relative the substrate, wherein said displacement monitor system comprises a position sensor (22, 28) and a reference frame (21, 29 ), wherein the position sensor measures a distance to the reference frame. The method comprises the steps of measuring x-,y-,and theta values of the master electrode, when the master electrode and the substrate are separated and when the master electrode and the substrate are adjacent calculating a delta value, which is the difference in measured x-,y-,and theta values; comparing the delta value to a reference value;and adjusting the position of the master electrode in relation to the substrate to minimize the delta value. A device for providing electricity to the substrate is also provided. The device comprises a contact module for mounting on the chuck on all sides of the substrate so that electrical contact is possible along the whole perimeter of a substrate.