| 摘要 |
<P>PROBLEM TO BE SOLVED: To form an air flow reliably in a transfer chamber by reducing stagnation of air in the transfer chamber. <P>SOLUTION: The substrate processing apparatus comprises a processing chamber of substrate, a substrate holding body which carries a substrate, while holding, in the processing chamber and carries the substrate out of the processing chamber, a transfer chamber in which the charge operation for holding an unprocessed substrate on the substrate holding body and the discharge operation for taking out a processed substrate from the substrate holding body are carried out, and a clean unit which blows clean air into the transfer chamber. The clean unit is disposed at a corner in the transfer chamber configured to have a polygonal plane view. <P>COPYRIGHT: (C)2012,JPO&INPIT |
