发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition suppressing generation of particles in a liquid of the composition even when stored for a long period of time, and having excellent storage stability as showing little change with time in characteristics such as superior sensitivity to radiation and a high receding contact angle during exposure. <P>SOLUTION: The radiation-sensitive resin composition contains: a fluorine-containing polymer (A) including a structural unit (f1) having a base-dissociable group; a compound (C) that generates an acid by irradiation with radiation; and a salt (D) that generates a compound having a specified pKa by irradiation with radiation. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012078510(A) |
申请公布日期 |
2012.04.19 |
申请号 |
JP20100222790 |
申请日期 |
2010.09.30 |
申请人 |
JSR CORP |
发明人 |
SERIZAWA RYUICHI;SOYANO AKIMASA;ASANO YUSUKE;ISHII TAKESHI;KAKIZAWA TOMOHIRO;MATSUDA YASUHIKO;KIMOTO TAKAKAZU |
分类号 |
G03F7/004;C08F220/22;C08F220/26;G03F7/039;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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