发明名称 |
Shared Compliance in a Rapid Exchange Device for Reticles, and Reticle Stage |
摘要 |
Provided is a method to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, a Rapid Exchange Device (RED) configured to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, and a system for manufacturing a semiconductor device lithographically. The method involves sharing compliance among six degree of freedom between the reticle stage (RS) and the RED. The RED complies in only a first three degrees of freedom and the reticle stage (RS) in only a second three degrees of freedom until the reticle stage (RS) and patterning device (1010) are substantially in contact and coplanar. |
申请公布号 |
US2012092640(A1) |
申请公布日期 |
2012.04.19 |
申请号 |
US201013260017 |
申请日期 |
2010.02.24 |
申请人 |
JOHNSON RICHARD JOHN;VAN DER MEULEN FRITS;WESTPHAL ERIC BERNARD;ASML HOLDING N.V. |
发明人 |
JOHNSON RICHARD JOHN;VAN DER MEULEN FRITS;WESTPHAL ERIC BERNARD |
分类号 |
G03B27/58 |
主分类号 |
G03B27/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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