| 摘要 |
PURPOSE: A composition for eliminating negative photoresist residues and a cleaning method using the same are provided to prevent the generation of pollutants such as metallic impurities by omitting the use of metal ion containing components. CONSTITUTION: A composition for eliminating negative photoresist residues includes 2-40 weight% of alkylbenzene sulfonic acid, 50-97 weight% of alkylbenzene compound, and 1-10 weight% of dihydroxy benzene compound. The alkylbenzene sulfonic acid is one or more selected from a group including dodecyl benzenesulfonic acid, toluene sulfonic acid, o-cresol sulfonic acid(2-methylphenol sulfonic acid), cresol sulfonic acid(methylphenol sulfonic acid), cumenesulfonic acid, xylene sulfonic acid, 2,5-xylene sulfonic acid, 2,4-xylene sulfonic acid, camphorsulfonic acid, and the salts of the same. The alkylbenzene compound is one or more selected from o-dimethyl benzene, m-dimethyl benzene, p-dimethyl benzene, 1,2,3-trimethyl benzene, and 1,3,5-trimethyl benzene. The dihydroxy benzene compound is one or more selected from catechol, resorcinol, and hydroquioline. |
