| 摘要 |
PURPOSE: A defect inspection method is provided to easily distinguish fault of a hole pattern due to defocuses of an exposure apparatus or troubles of exposure. CONSTITUTION: Illumination(L1) injected from a lamp house(LS) lights up a wafer(2) loaded on a stage(3). A tilt tool is formed in the stage and tilts the stage with an axis which is vertical with ground as the center. A polarizing plate is arranged in around an injection part of the lamp house. The polarizing plate rotates with an optical axis of an illumination optical system(1) as the center. An image processor(6) processes an image which is accepted by an image pickup device(5). The angle of diffraction of a diffracted light(L2) is changed by pitch of a repetition pattern and wavelengths of the illumination.
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