| 摘要 |
PURPOSE: A susceptor and a chemical vapor deposition apparatus having the same are provided to improve modulated complex lapped transform quality while controlling backside halo created in a process forming a single crystal film on the surface of a wafer. CONSTITUTION: A susceptor(180) comprises a bottom plate(181) and a lateral part(182) extended from the bottom plate. The lateral part is projected according to the circumference of the bottom plate as a fixed height. The lateral part comprises a supporting part(182a) in order to separately support a wafer(W) from the bottom plate. A space(S) is formed between the wafer settled on the supporting part and the bottom plate. A through opening part(182b) is formed in order to parallelly pass through the lateral part with the bottom plate.
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