| 摘要 |
<p>PURPOSE: A (meth)acrylate-based polymer is provided not to generate scum because of excellent solubility to developer, to have excellent adhesion to a substrate, and to manufacture a resin film with excellent implant resistance. CONSTITUTION: A (meth)acrylate-based polymer comprises repeating units in chemical formula 1-3. In chemical formulas, R^1 comprises hydrogen or a methyl group, R^10 comprises a substituted or unsubstituted C3-20 cycloalkyl group, or a substituted or unsubstituted C2-20 heterocycloalkyl group, n is an integer of 0-3, R^2 comprises hydrogen or a methyl group, R^20 comprises a substituted or unsubstituted C3-20 cyclo alkyl group including an ester group, R^3 comprises hydrogen or a methyl group, and R^30 comprises t-butyl, triethylcarbyl, 1-methylcyclohexy, 1- ethylcyclopentyl, t-amyl, or acetal.</p> |
