发明名称 Substrate surface modifications for compositional gradation of crystalline materials and associated products
摘要 A compositionally graded material having low defect densities and improved electronic properties is disclosed and described. A compositionally graded inorganic crystalline material can be formed by preparing a crystalline substrate by forming crystallographically oriented pits across an exposed surface of the substrate. A transition region can be deposited on the substrate under substantially epitaxial growth conditions. Single crystal substrates of a wide variety of materials such as diamond, aluminum nitride, silicon carbide, etc. can be formed having relatively low defect rates.
申请公布号 US8157914(B1) 申请公布日期 2012.04.17
申请号 US20070809718 申请日期 2007.05.31
申请人 SUNG CHIEN-MIN 发明人 SUNG CHIEN-MIN
分类号 C30B21/02 主分类号 C30B21/02
代理机构 代理人
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