| 发明名称 |
Wolfram metal eliminating fluid and method for eliminating wolfram metal by use thereof |
| 摘要 |
A removing solution for removing tungsten metal which causes a film formation on a semiconductor substrate or adheres to it, wherein orthoperiodic acid and water are contained.
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| 申请公布号 |
KR101135565(B1) |
申请公布日期 |
2012.04.17 |
| 申请号 |
KR20040099712 |
申请日期 |
2004.12.01 |
| 申请人 |
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发明人 |
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| 分类号 |
C11D7/18;C23F1/30;C09K13/08;C23F1/02;C23F1/16;C23F1/26;H01L21/302;H01L21/304;H01L21/306;H01L21/308;H01L21/3213;H01L21/44;H01L21/461 |
主分类号 |
C11D7/18 |
| 代理机构 |
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代理人 |
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| 地址 |
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