Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition

摘要

A compound which generates a sulfonic acid having one or more—SO3H groups and one or more—SO2—bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.