发明名称 |
Laser produced plasma EUV light source |
摘要 |
A device is disclosed herein which may include a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region, the plasma producing EUV radiation, wherein the droplet source comprises a fluid exiting an orifice and a sub-system producing a disturbance in the fluid which generates droplets having differing initial velocities causing the spacing between at least some adjacent droplets to decrease as the droplets travel to the irradiation region.
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申请公布号 |
US8158960(B2) |
申请公布日期 |
2012.04.17 |
申请号 |
US20100721317 |
申请日期 |
2010.03.10 |
申请人 |
VASCHENKO GEORGIY O.;ERSHOV ALEXANDER I.;SANDSTROM RICHARD L.;CYMER, INC. |
发明人 |
VASCHENKO GEORGIY O.;ERSHOV ALEXANDER I.;SANDSTROM RICHARD L. |
分类号 |
H01J49/00 |
主分类号 |
H01J49/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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