发明名称 Double-stacked EBG structure
摘要 In a double-stacked electromagnetic bandgap (EBG) structure, a first conductive plane and a second conductive plane are spaced apart in parallel. At least two EBG layers are embedded in parallel between the first conductive plane and the second conductive plane. The at least two EBG layers have different stopband characteristics. A plurality of vias connect the at least two EBG layers respectively to one of the first and second conductive planes. At least the vias connecting one of the EBG layers pass through via holes in cells of another EBG layer.
申请公布号 US8159413(B2) 申请公布日期 2012.04.17
申请号 US20090513354 申请日期 2009.05.01
申请人 PARK JONGBAE;LU CHEE WAI ALBERT;KIM JOUNGHO;AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH 发明人 PARK JONGBAE;LU CHEE WAI ALBERT;KIM JOUNGHO
分类号 H01Q15/02 主分类号 H01Q15/02
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