发明名称 |
Double-stacked EBG structure |
摘要 |
In a double-stacked electromagnetic bandgap (EBG) structure, a first conductive plane and a second conductive plane are spaced apart in parallel. At least two EBG layers are embedded in parallel between the first conductive plane and the second conductive plane. The at least two EBG layers have different stopband characteristics. A plurality of vias connect the at least two EBG layers respectively to one of the first and second conductive planes. At least the vias connecting one of the EBG layers pass through via holes in cells of another EBG layer. |
申请公布号 |
US8159413(B2) |
申请公布日期 |
2012.04.17 |
申请号 |
US20090513354 |
申请日期 |
2009.05.01 |
申请人 |
PARK JONGBAE;LU CHEE WAI ALBERT;KIM JOUNGHO;AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH |
发明人 |
PARK JONGBAE;LU CHEE WAI ALBERT;KIM JOUNGHO |
分类号 |
H01Q15/02 |
主分类号 |
H01Q15/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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