发明名称 Substrate position detection apparatus, and method of adjusting a position of an imaging component of the same
摘要 A method is disclosed for adjusting an arrangement of coordinates in an imaging area of an imaging component in a substrate imaging plane in a substrate position detection apparatus that detects a position of a substrate in accordance with an image taken of a circumferential portion of the substrate by the imaging component, the apparatus being arranged near a rotatable susceptor on which the substrate is placed and a substrate transferring apparatus prepared separately from the susceptor and configured to horizontally drive a supporting pin for transferring the substrate to and/or from the susceptor. This method includes supporting at a predetermined height above the susceptor by the supporting pin a mark-equipped wafer with a mark arranged corresponding to the circumferential portion of the substrate, bringing the mark into the imaging area, detecting the mark at plural points while horizontally moving the mark in one direction within the imaging area by a predetermined distance by horizontally driving the supporting pin, and calibrating an axis direction of the coordinates in accordance with a direction in which the plural points are arranged; and maintaining the mark-equipped wafer with a height adjustment jig at the predetermined height above the susceptor, bringing the mark into the imaging area, detecting the mark at plural points while moving the mark within the imaging area by a predetermined angle by rotating the susceptor, and calibrating an origin position of the coordinates in accordance with a rotation center obtained in accordance with the plural points.
申请公布号 US8159653(B2) 申请公布日期 2012.04.17
申请号 US20080523188 申请日期 2008.02.12
申请人 SHINDO TAKEHIRO;TOKYO ELECTRON LIMITED 发明人 SHINDO TAKEHIRO
分类号 G03B27/58 主分类号 G03B27/58
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