METHOD OF FORMING NANOPORE WITH SELF-LIMITED SIZE BY ATOMIC LAYER DEPOSITION

摘要

PURPOSE: A method for preparing nanopore with limited size by atom layer deposition is provided to produce a large amount of nanopores with uniform size. CONSTITUTION: A method for preparing nanopores(25) comprises: a step of forming an opening part at a membrane(23); and a step of forming the nanopores by forming a cover film(24) from a precursor using ALD(atom layer deposition) at one side of the opening part. The membrane further comprises a conductive layer and insulation layer placed at upper side, lower side, and both sides of the conductive layer.