发明名称 |
METHOD FOR PROCESSING SUBSTRATE, COMPUTER STORAGE MEDIUM, AND SUBSTRATE PROCESSING SYSTEM |
摘要 |
The invention relates to a method for processing a substrate on which a target film is formed. The method includes forming a first film on the target layer; forming a second film on the first film, the second film being photosensitive; patterning the second film with a photolithography process; removing a portion of the first film selectively using the second film as a mask; removing a portion of the target film selectively using the second film as a mask; reducing the width of first film to an intended width by removing sidewall portions thereof; forming a third film at least on the first film and on the top of the target film; removing the first film and the second film; and removing a portion of the target film using the third film as a mask.
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申请公布号 |
KR101134490(B1) |
申请公布日期 |
2012.04.13 |
申请号 |
KR20107005089 |
申请日期 |
2008.08.29 |
申请人 |
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发明人 |
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分类号 |
H01L21/3213;G03F7/40;H01L21/027 |
主分类号 |
H01L21/3213 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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