UNDERLAYER COMPOSITION AND METHOD OF IMAGING UNDERLAYER

摘要

PURPOSE: An underlayer composition and a method for imaging an underlayer are provided to form the patterned surface of the underlayer by lithographically varying the surface polarity. CONSTITUTION: A photo-sensitive layer includes a photoacid generator. Acid is generated by irradiating a part of the photo-sensitive layer. An underlayer includes acid-liable copolymer. The acid-liable copolymer includes an acid degradable group, an attaching group, and a functional group. The acid is dispersed to the adjacent part of the underlayer. The photo-sensitive layer is eliminated. A self-assembled layer is formed on the surface of the underlayer. The self-assembled layer includes block copolymer. The block copolymer includes a first block and a second block. The first block is affine to a polar region. The affinity of the second block to the polar region is smaller than the affinity of the first block. The first block forms a first domain which is aligned to the polar region. The second block forms a second domain which is adjacently aligned to the first domain. A lower part of the underlayer is exposed by eliminating either the first domain or the second main . The attaching group forms inter-polymer crosslink on the hydrophilic surface of a substrate.