| 摘要 |
PURPOSE: A substrate cleaning device is provided to prevent mist generated during a cleaning process from being leaked to the outside of a chamber, thereby preventing damage of a chamber and external equipment. CONSTITUTION: A substrate transfer unit(110) comprises a plurality of transfer shafts(112) and a roller(114). The transfer shafts are arranged in the upper and lower parts of a substrate. A brush cleaning unit comprises a brush(122) and a brush shaft(124). The brush contacts the substrate to physically eliminates contaminants from the substrate. A first nozzle(130) discharges a cleaning solution onto the substrate.
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