| 摘要 |
PURPOSE: A substrate drying device and a method thereof are provided to prevent particles from being attached to a surface of a substrate. CONSTITUTION: A hot pure water tank(10) includes hot pure water. A cassette elevating unit(30) elevates a cassette(20). An overflow unit consecutively supplies the hot pure water into the hot pure water tank. A control unit controls the lifting speed of the cassette in the range of 1 to 600 mm/min. A secondary vacuum absorption drying unit(50) dries moisture and a gas on the cassette and the substrate. |
