| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing method in which a process liquid containing phosphoric acid aqueous solution near the boiling point can be supplied to a substrate. <P>SOLUTION: Phosphoric acid, sulphuric acid, and water are supplied from a first tank 15 to a distribution passage X1 of a process liquid leading to a substrate W held on a spin chuck 2. Consequently a mixture of phosphoric acid, sulphuric acid, and water is produced. A liquid containing sulphuric acid and a liquid containing water are mixed in the distribution passage X1, and the temperature of the mixture of phosphoric acid, sulphuric acid, and water increases. A mixture containing phosphoric acid aqueous solution near the boiling point is supplied to the substrate W held on the spin chuck 2. <P>COPYRIGHT: (C)2012,JPO&INPIT |
