NANOIMPRINT MOLD, MANUFACTURING METHOD THEREOF, AND NANOIMPRINT METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To eliminate thickness unevenness of a resist film after imprint even in a nanoimprint method using a fine uneven pattern.

SOLUTION: The nanoimprint mold 10 is manufactured by forming the fine uneven pattern on the surface of a substrate. The substrate 12 which has a surface shape of the surface existing after mold release treatment is applied and before the uneven pattern is formed, and having 1 to 3 nm of a three-σ value regarding distribution in level difference is used as the substrate to manufacture the nanoimprint mold.

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