| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad performing stable polishing for a long period. <P>SOLUTION: The polishing pad 10 includes a polyurethane resin foamed sheet 2 having a foaming structure continuously formed with a plurality of foams 3 and a lot of micropores 6 by a wet deposition method. The sizes of the lot of micropores 6 are formed smaller than the sizes of the foams 3. In the foaming structure formed in the foamed sheet 2, an acid or alkali-resistant resin 5 is present in the lot of micropores 6 in such a manner that a ratio of the volume of the acid or alkali-resistant resin 5 to the volume of the micropores 6 is 30% or more. The acid or alkali-resistant resin 5 is formed by impregnating resin emulsion in the foamed sheet 2. The foaming structure of the foamed sheet 2 is reinforced by the acid or alkali-resistant resin 5 to protect the surfaces of the micropores 6. <P>COPYRIGHT: (C)2012,JPO&INPIT |
