| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an excellent method and a system for supervising flatness or non-flatness of a lithographic optical element. <P>SOLUTION: A method (200) for evaluating a lithography system and the components thereof are disclosed. The method (200) includes: in regard to electromagnetic radiation of a second wavelength or wavelength range, which is different from a first wavelength or wavelength range for lithographic processing in a lithography system, detecting (204) on a substrate having a photosensitive layer at least a portion of the electromagnetic radiation reflected on the lithographic optical element in the direction of the lithographic optical element; thereafter evaluating (205) the detected electromagnetic radiation; and from the evaluation of the exposed photosensitive layer, determining (206) convexoconcave shape parameters of the lithographic optical element and/or the holder therefor. <P>COPYRIGHT: (C)2012,JPO&INPIT |
