| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for thinning a dry resist capable of evenly and uniformly thinning the dry film resist. <P>SOLUTION: This method for thinning the dry film resist includes: a step for processing with process liquid, the dry film resist of a substrate to which the dry film resist is stuck; and after that, a step for removing an unnecessary dry film resist on the surface using liquid remover. In the removing step, the liquid remover is repetitively used, the density of the removed unnecessary dry film resist contained in the liquid remover is 0.5 mass% or less and pH of the liquid remover at a temperature of 20°C is within a range 6.0-9.0. <P>COPYRIGHT: (C)2012,JPO&INPIT |
