| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing method capable of stably controlling the concentration of a processing liquid and preventing the processing efficiency of a substrate processing device from deteriorating. <P>SOLUTION: If the concentration measured by concentration measurement means 37 is not within a normal concentration range, the substrate processing method determines that the concentration is abnormal and replaces the whole processing liquid. If the concentration is within the normal concentration range: when the concentration is within a target concentration range, the method processes the substrate with a processing liquid of measured concentration; when the concentration is within a first concentration range, the method replenishes a processing liquid only by a predetermined amount and corrects the concentration; and when the concentration is within a second concentration range, the method drains the processing liquid only by the predetermined amount and then replenishes a new processing liquid only by the predetermined amount. Having a plurality of concentration correction ranges provides stable concentration control. <P>COPYRIGHT: (C)2012,JPO&INPIT |
