发明名称 FOCUS OFFSET CONTAMINATION INSPECTION
摘要 A system and method for detecting defects on a reticle is disclosed. The method may comprise determining a best focus setting for imaging the reticle; obtaining a first image of the reticle, the first image obtained at the best focus setting plus a predetermined offset; obtaining a second image of the reticle, the second image obtained at the best focus setting minus the predetermined offset; generating a differential image, the differential image representing a difference between the first image and the second image; and identifying a defect on the reticle based on the differential image. The method in accordance with the present disclosure may also be utilized for detecting defects on at least a portion of the reticle.
申请公布号 US2012086799(A1) 申请公布日期 2012.04.12
申请号 US201113251975 申请日期 2011.10.03
申请人 HESS CARL;KLA-TENCOR CORPORATION 发明人 HESS CARL
分类号 H04N7/18 主分类号 H04N7/18
代理机构 代理人
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