发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate table; a sensor configured to measure an exposure parameter using a measuring beam projected through the liquid; and a correction system configured to determine an offset based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter. |
申请公布号 |
US2012086928(A1) |
申请公布日期 |
2012.04.12 |
申请号 |
US201113331865 |
申请日期 |
2011.12.20 |
申请人 |
BASELMANS JOHANNES JACOBUS MATHEUS;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;MERTENS JEROEN JOHANNES SOPHIA;MULKENS JOHANNES CATHARINUS HUBERTUS;STREEFKERK BOB;ASML NETHERLANDS B.V. |
发明人 |
BASELMANS JOHANNES JACOBUS MATHEUS;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;MERTENS JEROEN JOHANNES SOPHIA;MULKENS JOHANNES CATHARINUS HUBERTUS;STREEFKERK BOB |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|