| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a stencil mask comprising a pattern used efficiently for exposure while keeping mechanical strength in a partial batch exposure process. <P>SOLUTION: A stencil mask is composed of a membrane region having stencil patterns formed therein and a bulk region 102 surrounding the membrane region. In one membrane region, a plurality of stencil pattern groups corresponding to deflection regions 103 are placed. <P>COPYRIGHT: (C)2012,JPO&INPIT |
