| 发明名称 |
METHOD AND APPARATUS FOR CLEANING SUBSTRATE WITH LIGHT-SHIELDING FILM |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for cleaning a substrate with a light-shielding film for a large photomask, which is a cleaning method for effectively removing contaminations deposited. <P>SOLUTION: The method is provided for cleaning the substrate with the light-shielding film for the large photomask, wherein a pure water jet cleaning treatment is applied to the substrate such that a pure water is jetted from a nozzle in a state of fine grain diameter by applying a high pressure, and applied to the light-shielding film of the substrate with the light-shielding film. <P>COPYRIGHT: (C)2012,JPO&INPIT |
| 申请公布号 |
JP2012071236(A) |
申请公布日期 |
2012.04.12 |
| 申请号 |
JP20100216868 |
申请日期 |
2010.09.28 |
| 申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
MURAKAMI SHINICHIRO;TATEMOTO KAZUMA;HIDA ATSUSHI |
| 分类号 |
B08B3/02;B08B1/00;B08B3/12 |
主分类号 |
B08B3/02 |
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