| 摘要 |
<p>The invention relates to a method for facilitating the location of diffraction spots present on a diffraction pattern. This method comprises the following successive steps: a) the obtaining of a diffraction pattern by illuminating at least a part of a sample comprising at least one periodic zone by an incident beam of a radiation liable to be diffracted by said at least one periodic zone of the sample, and by placing a detector in the path of the beam thus diffracted; b) the locating of the diffraction spots present on the diffraction pattern obtained in step a), by determining the spatial coordinates of these spots on the detector. Step b) is facilitated by the use, in step a), of means which make it possible to modify the shape and to increase the length of contour of the diffraction spots which form on said pattern.</p> |
