SCANNING EXPOSURE DEVICE USING MICROLENS ARRAY

摘要

In a scanning exposure device, an exposure pattern of a mask (3) is projected onto a substrate (1) by a plurality of microlens arrays (2). The image on the substrate is then detected by a line CCD camera, and the exposure pattern of the mask is detected as matching or not matching a reference pattern, the reference pattern being a first pattern on the substrate. In the case where the patterns do not match, the microlens arrays are inclined from the direction parallel to the substrate to adjust the region on the substrate exposed by the microlens arrays and cause the exposure pattern of the mask to match the reference pattern. Thereby, even when the exposure pattern is misaligned with the reference pattern, this misalignment can be detected during exposure, misalignment of the position of the exposure pattern can be prevented, and the precision of the exposure pattern can be enhanced for repeated exposures.