发明名称 |
VAPOR DEPOSITION MATERIAL FOR FORMING THIN FILM, THIN FILM SHEET HAVING THE THIN FILM, AND LAMINATED SHEET |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vapor deposition material suitable for forming a thin film excellent in transparency and gas-barrier property, and to provide a thin film sheet having the thin film, and a laminated sheet. <P>SOLUTION: The vapor deposition material is prepared by mixing first oxide powder and second oxide powder, wherein; the first oxide powder is Y<SB POS="POST">2</SB>O<SB POS="POST">3</SB>powder; the first oxide powder has ≥98% purity of the first oxide; the second oxide powder is one kind of powder or two kinds of mixture powder selected from a group consisting of ZnO, MgO and CaO; the second oxide powder has ≥98% purity of the second oxide; the vapor deposition material comprises pellets containing first oxide particles and second oxide particles; the ratio of the first oxide to the second oxide in the vapor deposition material is (5 to 85):(95 to 15); and the pellets have a basicity of ≥0.1. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012072028(A) |
申请公布日期 |
2012.04.12 |
申请号 |
JP20100218832 |
申请日期 |
2010.09.29 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
MAYUZUMI YOSHIAKI;ARIIZUMI KUMIKO |
分类号 |
C04B35/453;C04B35/03;C04B35/04;C04B35/50;C23C14/08 |
主分类号 |
C04B35/453 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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