发明名称 VAPOR DEPOSITION MATERIAL FOR FORMING THIN FILM, THIN FILM SHEET HAVING THE THIN FILM, AND LAMINATED SHEET
摘要 <P>PROBLEM TO BE SOLVED: To provide a vapor deposition material suitable for forming a thin film excellent in transparency and gas-barrier property, and to provide a thin film sheet having the thin film, and a laminated sheet. <P>SOLUTION: The vapor deposition material is prepared by mixing first oxide powder and second oxide powder, wherein; the first oxide powder is Y<SB POS="POST">2</SB>O<SB POS="POST">3</SB>powder; the first oxide powder has &ge;98% purity of the first oxide; the second oxide powder is one kind of powder or two kinds of mixture powder selected from a group consisting of ZnO, MgO and CaO; the second oxide powder has &ge;98% purity of the second oxide; the vapor deposition material comprises pellets containing first oxide particles and second oxide particles; the ratio of the first oxide to the second oxide in the vapor deposition material is (5 to 85):(95 to 15); and the pellets have a basicity of &ge;0.1. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012072028(A) 申请公布日期 2012.04.12
申请号 JP20100218832 申请日期 2010.09.29
申请人 MITSUBISHI MATERIALS CORP 发明人 MAYUZUMI YOSHIAKI;ARIIZUMI KUMIKO
分类号 C04B35/453;C04B35/03;C04B35/04;C04B35/50;C23C14/08 主分类号 C04B35/453
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