发明名称 PARTICLE BEAM IRRADIATION SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To suppress overshoot of emission beam current waveform while ion beam is being turned on when emission of the ion beam from synchrotron is controlled. <P>SOLUTION: The particle beam irradiation system includes: synchrotron that accelerates and emits the ion beam; an irradiation device that irradiates an irradiation target with the ion beam emitted from the synchrotron; and a control device that controls the synchrotron and the irradiation device. The irradiation device has a scanning electromagnet that scans the ion beam passing by and a dose monitor that measures radiation dosage of the ion beam. The control device stores a target dosage value for each irradiation region of the irradiation target and a threshold, which is a value lower than the target dosage value, and solves the problem by controlling a current value of the ion beam emitted from the synchrotron until the time when an accumulated dosage value based on an output signal from a dose monitor becomes the threshold. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012070945(A) 申请公布日期 2012.04.12
申请号 JP20100218058 申请日期 2010.09.29
申请人 HITACHI LTD 发明人 NISHIUCHI HIDEAKI;TOTAKE SATOSHI;SAITO KAZUYOSHI
分类号 A61N5/10 主分类号 A61N5/10
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