| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pot which suppresses or prevents leakage of an atmosphere containing a process liquid and reduces an air exhaust amount, and to provide a substrate processing apparatus including the pot. <P>SOLUTION: A substrate processing apparatus includes a chemical nozzle 3 having a chemical discharge port 3a discharging a chemical and a chemical pot 5 disposed at a standby position P13. The chemical pot 5 includes a housing 25 defining an internal space S1 in which the chemical discharge port 3a is disposed and a partition member 26 dividing the internal space S1. The housing 25 has an insertion port 27 into which the chemical nozzle 3 is inserted and an exhaust port 28 disposed at a position lower than the insertion port 27. Further, the partition member 26 divides the internal space S1 into the upper space S2 and the lower space S3 at a height between the insertion port 27 and the exhaust port 28. The partition member 26 has a connection port 30 connecting the upper space S2 with the lower space S3. <P>COPYRIGHT: (C)2012,JPO&INPIT |
