| 摘要 |
<P>PROBLEM TO BE SOLVED: To easily enable a plasma process which is uniform in the circumferential direction as well as the radial direction, while sufficiently suppressing a wavelength effect in a radio frequency (RF) antenna. <P>SOLUTION: In an induction-coupled plasma processing apparatus, an RF antenna 54 provided on a dielectric window 52 to generate induction-coupled plasma is divided into an inner coil, an intermediate coil, and an outer coil 62 in the radial direction. The inner coil 58 has a single inner coil segment 59 or serially-connected inner coil segments 59. The intermediate coil 60 is divided in the circumferential direction and has two intermediate coil segments 61(1) and 61(2) which are electrically connected in parallel. The outer coil 62 is divided in the circumferential direction and has three outer coil segments 63(1), 63(2), and 63(3) which are electrically connected in parallel. <P>COPYRIGHT: (C)2012,JPO&INPIT |
